Diamond film deposition by chemical vapor transport

Acta Astronautica

Volumn 48, Issue 2-3, 2001, Pages 129-144

  Regel, Liya L ^a   Wilcox, William R ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CENTRIFUGATION; CENTRIFUGES; CHEMICAL VAPOR DEPOSITION; COPPER; GLASS; GRAPHITE; GRAVITATIONAL EFFECTS; MOLYBDENUM; NUCLEATION; SILICON;

CHEMICAL VAPOR TRANSPORT; MICROGRAVITY;

DIAMOND FILMS;

EID: 0035062235     PISSN: 00945765     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0094-5765(00)00155-7     Document Type: Article

References (158)

1. Regel, L. L, Takagi, Y. and Wilcox, W. R., Centrifugal diamond film processing. In Centrifugal Materials Processing, ed. L. L. Regel and W. R. Wilcox. Plenum, New York, 1997, pp. 221-228.
2. Takagi, Y., Regel, L. L. and Wilcox, W. R., New method for diamond film deposition under different gravity conditions. JASMAC 1998, 15, 140-145.
3. Regel, L. L. and Wilcox, W. R., Selective patterned deposition of diamond using a new technique. Journal of Materials Research Letters 1999, 18, 427-430, plus cover photo.
4. Regel, L. L. and Wilcox, W. R., Diamond film deposition by a new technique: patterned selective; graphite, glass, carbon felt and silicon substrates; influence of centrifugation. Proceedings of the 1999 NSF Design and Manufacturing Grantees Conference, Los Angeles, University of Southern California (CD ROM), January 1999.
5. Regel, L. L. and Wilcox, W. R., Deposition of diamond on graphite and carbon felt from graphite heated in hydrogen at low pressures. Journal of Materials Research Letters, 2000, 19, 455-457.
6. Shitaka, S., The road to commercialization of vapor-phase-grown diamond. MRS Bulletin, 1998, 23(9), 61-64.
7. Brown, W. D. et al., Large area diamond film deposition for multichip modules (MCMs). In: Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, ed. K. V. Ravi and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995, pp. 636-642.
8. Davidson, J. L., Brown, W. D. and Dismukes, J. P., CVD diamond, a unique dielectric, semiconductor and thermal conductor for electronic applications. In: Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, ed. K. V. Ravi and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995, pp. 537-545.
9. Butler, J. E. and Windeschmann, H., Developments in CVD-diamond synthesis during the past decade. MRS Bulletin, 1998, 23(9), 22-27.
10. Applied Science and Technology Inc., Woburn, MA 01801.
11. General Electric Corp., Columbus, OH.
12. Crystallume Inc., Santa Clara, CA 95054 (www.crystallume.com).
13. National Institute for Research on Inorganic Materials, Tsukuba, Japan (www.nirim.go.jp/ nirim/english).
14. P1 Limited, Mountain View, CA 94043 (www.p1diamond.com).
15. Technodiamant, Mt. Arlington, NJ 07856 (www.technodiamant.com).
16. Mitsubishi Materials Corporation, Japan.
17. Centronic Ltd., Croydon CR9 0BG, England (www.contronic.co.uk).
18. Wei, J. and Ahn, J., Irradiation induced failure of diamond based UV detector. Crystal Research Technology, 1999, 34, 133.
19. McKeag, R. D. and Jackman, R. B., Diamond photodetectors for UV laser-based applications. Lasers in Synthesis, Characterization, and Processing of Diamond, Proceedings of the SPIE, 1997, 3484, 182-194.
20. General Vacuum, Cleveland, OH 44143 (www.genvac.com).
21. Zhirnov, V. V. and Hren, J. J., Electron emission from diamond films. MRS Bulletin 1998, 23(9), 42-48.
22. Yang, S. H. and Yokoyama, M., Electron emission behaviors of polycrystalline-diamond-coated silicon emitters. Japan Journal of Applied Physics, 1999, 38, 209-212.
23. Geis, M. W., Twichell, J. C. and Lyszczarz, T. M., Diamond emitters fabrication and theory. Journal of Vacuum Science Technology, B, 1996, 14, 2060 -2067.
24. Sheu, J. T., Yang, G. Y. and Huang, B. R., Properties of polycrystalline diamond as X-ray mask. Materials and Device Characterization in Micromachining, Proceedings of the SPIE, 1998, 3512, 173-180.
25. Glass, J. T., Fox, B. A., Dreifus, D. L. and Stoner, B. R., Diamond for electronics: future prospects of diamond SAW devices. MRS Bulletin, 1998, 23(9), 49-55.
26. Swain, G. M., Anderson, A. B. and Angus, J. C., Applications of diamond films in electrochemistry. MRS Bulletin, 1998, 23(9), 56-60.
27. Troupe, C. E., Drummond, I. C., Graham, C., Grice, J., John, P. and Wilson, J. I. B., Diamond-based glucose sensors. Diamond and Related Materials, 1998, 7, 575-580.
28. Cholewa, M., Kamiya, T., Saint, A., Prawer, S., Legge, G., Butler, J. E. and Vestyck Jr., D. J., Diamond membranes: applications for single ion detection using secondary electron emission. Diamond and Related Materials, 1998, 7, 510-512.
29. Shih, A., Yater, J., Pehrsson, P., Butler, J., Hor, C. and Abrams, R., Secondary electron emission from diamond surfaces. Journal of Applied Physics, 1997, 82, 1860-1866.
30. Glass, J. T. et al., High quality semiconducting diamond films and devices. In Advances in New Diamond Science and Technology, eds. S. Saito et al.. MYU, Tokyo, 1994.
31. Wolter, S. D., Borst, T. H., Gluche, P., Ebert, W., Vescan, A. and Kohn E., Fabrication of highly oriented, smooth diamond films on silicon for electronic devices. Materials Research Society Symposium Proceedings, Vol. 423, III-Nitride, SiC and Diamond Materials for Electronic Devices, 1996, pp. 63-68.
32. Rameshan, R., Fabrication of diamond microstructures for microelectromechanical systems (MEMS) by a surface micromachining process. Thin Solid Films, 1999, 340, 1-6.
33. Turner, R. E., Landen, O. L., Bell, P., Costa, R. and Hargrove, D., Achromatically filtered diamond photoconductive detectors for high power soft X-ray flux measurements. Review of Scientific Instruments 1999, 70, 656-658.
34. DeVries, R. C., Badzian, A. and Roy, R., Diamond synthesis: the Russian connection. MRS Bulletin, 1996, 21(2), 65-75.
35. Angus, J. C. and Hayman, C. C., Low-pressure, metastable growth of diamond and 'diamondlike' phases. Science, 1988, 241, 913-921.
36. Spitsyn, B. V., private communications, Institute of Physical Chemistry, USSR Academy of Sciences, 1989, 1990, 1993, 1994, 1998.
37. Spitsyn, B. V., Bouilov, L. L. Derjaguin, B. V., Vapor growth of diamond on diamond and other surfaces. Journal of Crystal Growth 1981, 52, 219-226.
38. Angus, J. C., Buck, F. A., Sunkara, M., Groth, T. F., Hayman, C. C. and Gat, R., Diamond growth at low pressures. MRS Bulletin 1989, 14(10), 38-47.
39. Celii, F. G. and Butler, J. E., Diamond chemical vapor deposition. Annual Review of Physical Chemistry, 1991, 42, 643-684.
40. Angus, J. C., Wang, Y. and Sunkara, M., Metastable growth of diamond and diamond-like phases. Annual Review of Materials Science, 1991, 21, 221-248.
41. Fedoseev, D. V., Summary of research on diamond growth from the gas phase in Russia. In Synthetic Diamond: Emerging CVD Science and Technology, ed. K. E. Spear and J. P. Dismukes. Wiley, New York, 1994, pp. 41-55.
42. Setaka, N., Development of diamond science and technology in Japan. In Synthetic Diamond: Emerging CVD Science and Technology, ed. K. E. Spear and J. P. Dismukes. Wiley, New York, 1994, pp. 57-90.
43. Angus, J. C., Development of low-pressure diamond growth in the United States. In Synthetic Diamond: Emerging CVD Science and Technology, ed. K. E. Spear and J. P. Dismukes. Wiley, New York, 1994, pp. 21-39.
44. Goodwin, D. G. and Butler, J. E., Theory of diamond chemical vapor deposition. In: Handbook of Industrial Diamonds and Diamond Films, eds. M. A. Prelas, G. Popovici and L. K. Bigelow. Marcel Dekker Inc., New York, 1996, pp. 1-70.
45. Liu, H. and Dandy, D. S., Studies on nucleation process in diamond CVD: an overview of recent developments. Diamond and Related Materials 1995, 4, 1173-1188.
46. Butler, J. E. and Woodin, R. L., Thin film diamond growth mechanisms. Philosophical Transactions of the Royal Society of London A, 1993, 342, 209-224.
47. Singh, J., Nucleation and growth mechanism of diamond during hot-filament chemical vapor deposition. Journal of Materials Science, 1994, 29, 2761-2766.
48. Pehrsson, P. E., Celii, F. G. Butler, J. E., Chemical mechanisms of diamond CVD. In Diamond Films and Coatings; Development, Properties, and Applications, ed. R.F. Davis. Noyes Publications, Park Ridge, NJ, 1992.
49. Stoneham, A. M., Ford, I. J. and Chalker, P. R., Diamond films: recent developments in theory and practice. MRS Bulletin, 1998, 23(9), 28-31.
50. Gruen, D. M., Nucleation, growth, and microstructure of nanocrystalline diamond films. MRS Bulletin, 1998, 23(9), 32-35.
51. Pehrsson, P. E., Celli, F. G. and Butler, J. E., Chemical mechanisms of diamond CVD. In: Diamond Films and Coatings, ed. R. F. Davis. Noyes Publications, Park Ridge, NJ, 1993, pp. 68-146.
52. Schermer, J. J., van Enckevort, W. J. P. and Giling, L. J., Orientation dependent surface stabilization on flame deposited diamond single crystals. Journal of Crystal Growth, 1995, 148, 248-260.
53. Yarina, K. L., Dandy, D. S., Jensen E. and Butler, J. E., Growth of diamond films using an enclosed methyl-acetylene and propadiene combustion flame. Diamond Related Materials, 1998, 7, 1491-1502.
54. 2-strained flames. Combustion and Flame, 1993, 92, 144-160.
55. Gat, R., Chung, M., Sevillano, E. and Kelly, E., The technology of diamond coatings at low pressure. In Finer Points (Industrial Diamond Association) 8[2]. Applied Science and Technology, Inc., Woburn, MA, 1998.
56. Wei, J., Kawarada, H., Suzuki, J. and Hiraki, A., Growth of diamond films at low pressure using magneto-microwave plasma CVD. Journal of Crystal Growth, 1990, 99, 1201-1205.
57. 3 in a dc arcjet plasma during diamond deposition using laser-induced fluorescence. SRI International, MP 96-020a, 1996.
58. Jeffries, J. B., Raiche, G. A. and Brown, M. S., Optical diagnostics of diamond CVD plasmas. In: Laser Techniques for State-Selected and State-to-State Chemistry II, SPIE Proceedings Series, Vol. 2124, 1994, pp. 270-277.
59. Raiche, G. A., Smith, G. P. and Jeffries, J. B., Diagnostics of a diamond-depositing DC-arc-jet plasma, in: New Diamond Science and Technology II, eds. R. Messier, J. T. Glass, J. E. Butler and R. Roy. Materials Research Society, Warrendale, PA, 1991, pp. 251-256.
60. Zuiker, C., Krauss, A. R., Gruen, D. M., Pan, X., Li, J. C., Csencsits, R., Erdemir, A. and Bindal, C., Physical and tribological properties of diamond films grown in argon-carbon plasmas. Thin Solid Films, 1995, 270, 154-159.
61. Gruen, D. M., Liu, S., Krauss, A. R. and Pan, X., Buckyball microwave plasmas: fragmentation and diamond-film growth. Journal of Applied Physics, 1994, 75, 1758-1763.
62. Gruen, D. M., Liu, S., Krauss, A. R., Liu, J. and Pan, X., Fullerenes as precursors for diamond film growth without hydrogen or oxygen additions. Applied Physics Letters, 1994, 64, 1502-1504.
63. 2, as a growth species for diamond films from methane/hydrogen/argon microwave plasmas. Journal of Vacuum Science and Technology A, 1995, 13, 1628-1632.
64. Gruen, D. M., Zuiker, C. D. and Krauss, A. R., Diamond films grown from fullerene precursors. In: Fullerenes and Photonics II, Proceedings SPIE, Vol. 2530, 1995, 2-13.
65. McMaster, M. C., Hsu, W. L., Coltrin, M. L. and Dandy, D. S., Experimental measurements and numerical simulations of the gas composition in a hot-filament-assisted diamond chemical-vapor-deposition reactor. Journal of Applied Physics, 1994, 76, 7567-7577.
66. Roozbehani. B., Electrodeposition of carbon from aqueous solutions and experimental and modeling studies of CVD diamond film synthesis, PhD dissertation, Case Western Reserve University, Cleveland, Ohio (1996).
67. Feigerle, C. S. and Shaw, R. W., Laser diagnostics of CVD diamond film growth. Optics and Photonics News, Optical Society of America, May, 1996, 24-28.
68. Anthony, T. R., Vacuum, 1990, 41, 1356.
69. Geis, M. W. and Angus, J. C., Diamond Film Semiconductors. Scientific American, 1992, 267(4), 84-89.
70. Mehandru, S. P., Anderson, A. B. and Angus, J. C., Hydrogenation of the {1010} graphite edge. Structural considerations from band calculations. Journal of Physical Chemistry, 1992, 96, 10,978-10,982.
71. Angus, J. C., Li, Z., Sunkara, M., Lee, C. H., Lambrecht, W. R. L. and Segall, B., Diamond nucleation by hydrogenation of prism surfaces of graphite. In Proceedings of the Third International Symposium on Diamond Materials, Electrochemical Society Proceedings 93-17, eds. K. V. Ravi and J. P. Dismukes. Electrochemical Society, Pennington, NJ, 1993, pp. 128-132.
72. Li, Z., Wang, L., Suzuki, T., Argoitia, A., Pirouz, P. and Angus, J. C., Orientation relationship between chemical vapor deposited diamond and graphite substrates. Journal of Applied Physics, 1993, 73, 711-715.
73. Lambrecht, W. R. L., Lee, C. H., Segall, B., Angus, J. C., Li, Z. and Sunkara, M., Diamond nucleation by hydrogenation of the edges of graphitic precursors. Nature, 1993, 364, 607-610.
74. Gat, R. and Angus, J. C., Hydrogen atom recombination on tungsten and diamond in hot filament assisted deposition of diamond. Journal of Applied Physics, 1993, 74, 5981.
75. Zhuo, S., Zheng, Z. and Xu, N., Influence of pretreatments and deposition parameters on diamond nucleation density in diamond film deposition by hot filament CVD. Proceedings of SPIE 2364, Second International Conference on Thin Film Physics and Applications, 1994, pp. 582-587.
76. Singh, J., Nucleation and growth mechanism of diamond during hot-filament chemical vapor deposition. Journal of Materials Science, 1994, 29, 2761-2766.
77. Liu, H. and Dandy, D. S., Initial nucleation stages in diamond CVD: a theoretical approach. In: Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, eds. K. V. Ravi and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995.
78. Zhang, R. Q., Wang, W. L., Estevea, J. and Bertran, E., Molecular mechanics simulation of the diamond nucleation and growth on silicon (0 0 1) and (1 1 1) surfaces. Thin Solid Films, 1998, 317, 6-9.
79. Zhu, W., Yang, P. C., Glass, J. T. and Arezzo, F., Diamond nucleation and growth on reactive transition-metal substrates. Journal of Materials Research, 1995, 10, 1455-1460.
80. Borges, C. F. M., Schelz, S., Martinu, L. and Moisan, M., Effect of silicon substrate orientation on the nucleation and adhesion of CVD diamond films. Proceedings of the International Symposium on Diamond Materials. The Electrochemical Society, 1995, pp. 136-141.
81. Chen, Y., Mei, J., Chen, Q. and Lin, Z., Achieving high nucleation density of diamond film under low pressures in hot-filament chemical vapor deposition. Materials Research Society Symposium Proceedings, Vol. 363, Chemical Vapor Deposition of Refractory Metals and Ceramics III, 1995, pp. 175-180.
82. Drory, M. D., Diamond-coating of metal alloys. In Applications of Diamond Films and Related Materials: Third International Conference, eds. A. Feldman, Y. Tzeng, W. A. Yarbrough, M. Yoshikawa and M. Murakawa. Elsevier, Amsterdam, 1995, pp. 313-320.
83. Sakamoto, Y., Takaya, M., Sugimura, H., Takai O. and Nakagiri, N., Site-selective diamond growth using a platinum film and a silicon oxide mask. Applied Physics Letters, 1998, 73, 1913-1915.
84. Hao, T. L. and Shi, C.R., Synthesis of ultrathin diamond film on fused silica substrate. Thin Film Physics and Applications, Proceedings of the SPIE 1998, 3175, 192-195.
85. Liu, W., Tucker, D. A., Yang, P. and Glass, J. T., Nucleation of oriented diamond particles on cobalt substrates. Journal of Applied Physics, 1995, 78, 1291-1296.
86. Shah, S. I., Waite, M. M. and Walls, D. J., Effects of process parameters on the nucleation and growth of diamond thin films on carbon fibers. In Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, eds. K. V. Ravi, and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995, pp. 142-151.
87. Stoner, B. R., Ma, G. H. M., Wolter, S. D. and Glass, J. T., Characterization of bias-enhanced nucleation of diamond on silicon by in vacuo surface analysis and transmission electron microscopy. Physical Review B, 1992, 45, 67-84.
88. Wolter, S. D., Glass, J. T. and Stoner, B. R., Bias induced diamond nucleation studies on refractory metal substrates. Journal of Applied Physics, 1995, 77, 5119-5124.
89. Lee, J. W., Kim, S. H., Park Y. S. and Han, I. T., Cyclic technique for the enhancement of highly oriented diamond film growth. Thin Solid Films 1997, 303, 264-268.
90. Wolter, S. D., Glass, J. T. and Stoner, B. R., Investigation of the process factor space on bias-enhanced nucleation of diamond. Thin Solid Films 1995, 261, 4-11.
91. Reinke, P., Kania, P. and Oelhafen, P., Investigation of the nucleation mechanism in bias-enhanced diamond deposition on silicon and molybdenum. Thin Solid Films 1995, 270, 124-129.
92. Reinke, P. and Oelhafen, P., Bias-enhanced nucleation of diamond on molybdenum: a photoelectron spectroscopy study of the initial stages of the growth process. Journal of Applied Physics, 1998, 84, 2612-2617.
93. Huang, J. T., Yeh, W. Y., Hwang, J. and Chang, H., Bias enhanced nucleation and bias textured growth of diamond on silicon (1 0 0) in hot filament chemical vapor deposition. Thin Solid Films, 1998, 315, 35-39
94. Zhu, W., Sivazlian, F. R., Stoner, B. R. and Glass, J. T., Nucleation and selected area deposition of diamond by biased hot filament CVD. Journal of Materials Research, 1995, 10, 425-430.
95. Li, X., Hayashi, Y. and Nishino, S., An improved method for large-area oriented nucleation of diamond during bias process via hot-filament chemical vapor deposition. Thin Solid Films, 1997, 308-309, 163-167.
96. Li, X., Hayashi, Y., Yasuaki, N. and Nishino, S., Analyses of an oriented diamond nucleation processes on Si substrate by hot filament chemical vapor deposition. Japanese Journal of Applied Physics, 1997, 36, 5197-5201.
97. Li, X., Shirafuji, T., Hayashi, Y., Lilov, S. and Nishino, S., Diamond nucleation on single-crystalline 6H-SiC substrates by bias-enhanced nucleation in hot filament chemical vapor deposition. Japanese Journal of Applied Physics, 1997, 36, 6295-6299.
98. Battaile, C. C., Srolovitz, D. J. and Butler, J. E., Morphologies of diamond films from atomic-scale simulations of chemical vapor deposition. Diamond and Related Materials, 1997, 6, 1198-1206.
99. Cassidy, W. D., Morrison Jr. P. W. and Angus, J. C., Growth rates and quality of diamond growth by hot-filament assisted chemical vapor deposition. Proceedings of the Fourth International Symposium on Diamond Materials. Electrochemical Society, 1995.
100. Spitsyn, B. V., The state of the art in studies of diamond synthesis from the gaseous phase and some unsolved problems. In Applications of Diamond Films and Related Materials, eds. Y. Tzeng, M. Yoshikawa, M. Murakami and A. Feldman. Elsevier, Amsterdam, 1991, pp. 475-482.
101. Yu, B. W. and Girshick, S. L., Atomic carbon vapor as a diamond growth precursor in thermal plasmas. Journal of Applied Physics, 1994, 75, 3914-3923.
102. Burton, N. C., Butler, J. E., Lang, A. R. and Steeds, J. W., On a characteristic misorientation structure within (0 0 1) facets of CVD-grown diamond crystallites: an analysis by optical microtopography, interferometry, electron diffraction and cathodoluminescence. Proceedings of the Royal Society of London A, 1995, 449, 555-566.
103. Yang, G. S., Aslam, M., Kuo, K. P., Reinhard, D. K. and Asmussen, J., Effect of ultrahigh nucleation density on diamond growth at different growth rates and temperatures. Journal of Vacuum Science and Technology, B, 1995, 13, 1030.
104. Koboyashi, K., Karasawa, S., Watanabe, T. and Togashi, F., Growth of diamond thin films on silicon and TEM observation of the interface. Journal of Crystal Growth, 1990, 99, 1211-1214.
105. Regel, L. L., Takagi, Y. and Wilcox, W. R., Centrifugal diamond film processing. In Centrifugal Materials Processing, eds. L. L. Regel and W. R. Wilcox. Plenum Press, New York, 1997, pp. 214-220.
106. 2 mixtures: importance for diamond CVD. Journal of Materials Research, 1990, 5, 2433-2440.
107. Spitsyn, B. V., Crystallization of diamond by the chemical transport reaction: thermodynamics and kinetics. In Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, eds. K. V. Ravi and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995, pp. 61-72.
108. Salvadori, M. C., Ager III, J. W., Brown, I. G. and Krishnan, K. M., Diamond synthesis by microwave plasma chemical vapor deposition using graphite as the carbon source. Applied Physics Letters, 1991, 59, 2386-2388.
109. Jou, S., Doerr, H. J. and Bunshah, R. F., Diamond coatings from a solid carbon source. Thin Solid Films, 1994, 253, 95-102.
110. Lai, G. R., Farabaugh, E. N., Feldman, A. and Robins, L. H., Deposition of diamond films in a closed hot filament CVD system. Journal of Research of the National Institute of Standards Technology, 1995, 100, 43-49.
111. Farabauch, E. N., Lai, G. R., Feldman A. and Robins, L. H., A closed CVD system for the deposition of diamond films. In Applications of Diamond Films and Related Materials: Third International Conference, eds. A. Feldman, Y. Tzeng, W. A. Yarbrough, M. Yoshikawa and M. Murakawa. Elsevier, Amsterdam, 1995, pp. 361-364.
112. Takagi, Y., Hibiya, K. and Taeuchi, H., Synthesis of diamond thin films from graphite by gaseous reaction and application for microgravity environment. JASMAC 1996, 13, 225-233.
113. Newson, P. M., Studies of diamond film formation. Ph.D. Dissertation, Georgia Institute of Technology, 1997.
114. Woo, H. K., Lee, C. S., Bello, I., Lee, S. T., Wong, K. W. and Wong, N. B., Oriented diamond growth on silicon (1 1 1) using a solid carbon source. Journal of Applied Physics, 1998, 83, 4187-4192.
115. Lersmacher, B., Lydtin, H., Knippenberg, W. F. and Moore, A. W., Thermodynamische Betrachtungen zur Kohlensoffabscheidung bei der Pyrolyse Gasförmiger Kohlenstoffverbindungen. Carbon, 1967, 5, 205-217.
116. Duff, R. E. and Bauer, S. H., Equilibrium composition of the C/H system at elevated temperatures. Journal of Chemical Physics, 1962, 36, 1754-1767.
117. Baddour, R. F. and Blanchet, J. L., Reactions of carbon vapor with hydrogen and with methane in a high intensity arc. I& EC Process Design and Development, 1964, 3, 258-265.
118. John, P., Drummond, I. C., Milne, D. K., Jubber, M. G. and Wilcox, J. I. B., Fundamental limits to growth rates in a methane-hydrogen microwave plasma. Diamond and Related Materials, 1993, 3, 56-60.
119. Chase Jr., M. W. et al. (eds.), JANAF Thermochemical Tables, Journal of Physical and Chemical Reference Data, Part 2, 1985, 14 (Suppl. 1), 1211.
120. Krakowski, R. A. and Olander, D. R., Survey of the literature on the carbon-hydrogen system. Lawrence Radiation Laboratory, UCRL-19149, 1970.
121. Balooch, B. and Olander, D. R., Reactions of modulated molecular beams with pyrolytic graphite. III. Hydrogen. Journal of Chemical Physics, 1975, 63, 4722-4786.
122. Winters, H. F., Seki, J., Rye, R. R. and Coltrin, M. E., Interaction of hydrogen, methane, ethylene, and cyclopentane with hot tungsten: implications for the growth of diamond films. Journal of Applied Physics, 1994, 76, 1228-1243.
123. de Koranyi, A., Parkyns, N. D. and Peacock, S. J., The reactivity of graphite towards hydrogen. Proceedings of the Fifth London International Carbon and Graphite Conference. Society of Chemical Industry, London, 1978, pp. 139-149.
124. Szabó, Z., The examination of a system carbon and hydrogen in the temperature range 1100-2600°C. Journal of American Chemical Society, 1950, 72, 3497-3502.
125. Steck, S. J., Pressley Jr., G. A., Lin, S. S. and Stafford, F. E., Mass-spectrometric investigation of the reaction of hydrogen with graphite at 1900°-2400°K. Journal of Chemical Physics, 1969, 50, 3196-3207.
126. Gulbransen, E. A., Andrew, K. F. and Brassart, F. A., The reaction of hydrogen with graphite at 1200° to 1650°C. Journal of Electrochemical Society, 1965, 112, 49-52.
127. Clarke, J. T. and Fox, B. R., Reaction of graphite filaments with hydrogen above 2000°K. Journal of Chemical Physics, 1967, 46, 827-836.
128. Hsu, W. L., Chemical erosion of graphite by hydrogen impact: a summary of the database relevant to diamond film growth. Journal of the Vacuum Science and Technology, A 1988, 6, 1803-1811.
129. Pan, Z., Mechanistic studies of uncatalyzed and catalyzed carbon gasification reactions. Ph.D. Dissertation, State University of New York at Buffalo, 1996.
130. 4 formation from the reaction of H with graphite. Journal of Chemical Physics, 1975, 63, 1825-1836.
131. Rye, R. R., Reaction of thermal atomic hydrogen with carbon. Surface Science, 1977, 69, 653-667.
132. Dandy, D. S. and Coltrin, M. E., Effects of temperature and filament poisoning on diamond growth in hot-filament reactors. Journal of Applied Physics, 1994, 76, 3102-3113.
133. Celii, F. G., Pehrsson, P. E., Wans, H. T., Nelson, H. H. and Butler, J. E., In-situ detection of gaseous species in the filament-assisted diamond growth environment. In Science and Technology of New Diamond, eds. S. Saito, O. Fukunaga and M. Yoshikawa. KTK Scientific Publishers/Terra Scientific Publishing Company, 1990, pp. 17-23.
134. Butler, J. E., Celii, F. G., Oakes, D. B., Hanssen, L. M., Carrington W. A. and Snail, K. A., Studies of diamond chemical vapor deposition. High Temperature Science, 1990, 27, 183-197.
135. Jones, L. L., Shaw, R. W. and Feigerle, C. S., Gas phase diagnostics for CVD diamond growth. Applied Diamond Conference, Gaithersburg, July 1995.
136. Celii, F. G., Pehrsson, P. E., Wang, H. T. and Butler, J. E., Infrared detection of gaseous species during the filament-assisted growth of diamond. Applied Physics Letters, 1988, 52, 2043-2045.
137. Jones, L. L., Shaw, R. W. and Feigerle, C. S. Gas phase diagnostics for CVD diamond growth. In Applications of Diamond Films and Related Materials: Third International Conference, eds. A. Feldman, Y. Tzeng, W. A. Yarbrough, M. Yoshikawa and M. Murakawa. Elsevier, Amsterdam, 1995, pp. 433-436.
138. Hsu, W. L., McMaster, M. C., Coltrin, M. E. and Dandy, D. S., Molecular beam mass spectroscopy studies of chemical vapor deposition of diamonds. Japanese Journal of Applied Physics, 1994, 33, 2231-2239.
139. Connell, L. L. Fleming, J. W., Chu, H. N., Vestyck Jr., D. J., Jensen, E. and Butler, J. E., Spatially resolved atomic hydrogen concentrations and molecular hydrogen temperature profiles in the chemical-vapor deposition of diamond. Journal of Applied Physics, 1995, 78, 3622-3634.
140. Derebail, R., Arnold, W. A., Rosen, G. J., Wilcox, W. R. and Regel, L. L., HIRB - the centrifuge facility at Clarkson. In Materials Processing in High Gravity, eds. L. L. Regel and W. R. Wilcox. Plenum Press, New York, 1994, pp. 203-212. http://www.clarkson.edu/~regel/centrifg.htm.
141. Ulrich, R., Malshe, A., Gordon, M., Palmer, J. and Li, J., Finite-element modeling of a hot filament CVD diamond deposition reactor optimized for large area deposition. In Applications of Diamond Films and Related Materials: Third International Conference, eds. A. Feldman, Y. Tzeng, W. A. Yarbrough and M. Murakawa. Elsevier, Amsterdam, 1995, pp. 673-676.
142. FLUENT Incorporated, Leganon, New Hampshire, 03766 (www.fluent.com).
143. 3 concentration in a hot-filament reactor using cavity ring-down spectroscopy. Diamond and Related Materials, 1996, 5, 373-377.
144. Zalicki, P., Ma, Y., Zare, R. N., Wahl, E. H., Owano, T. G. and Kruger, C. H., Measurement of the methyl radical concentration profile in a hot-filament reactor. Applied Physics Letters, 1995, 67, 144-146.
145. 3 concentration in a hot-filament reactor. Proceedings Volume of Diamond 96, Tours, France, 1996.
146. Coltrin, M. E. and Dandy, D. S., Analysis of diamond growth in subatmospheric dc plasma-gun reactors. Journal of Applied Physics, 1993, 74, 5803-5820.
147. Mankelevich, Y. A., Rakhimov, A. T., Suetin, N. V. and Vagin, V. P., Two-dimensional model of a HFCVD reactor. In Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, eds. K. V. Ravi and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995, pp. 687-692.
148. Dandy, D. S. and Coltrin, M. E., Models of transport, gas-phase and surface chemistry in diamond chemical vapor deposition. In Diamond Materials IV, Proceedings of the Fourth International Symposium on Diamond Materials, eds. K. V. Ravi and J. P. Dismukes. Electrochemical Society Proceedings 95-4, 1995.
149. Srolovitz, D. J., Dandy, D. S., Butler, J. E., Battaile, C. C. and Paritosh, The integrated multiscale modeling of diamond chemical vapor deposition. JOM, Minerals Metals and Materials Society, 1997, 49(9), 42-47.
150. Battaile, C., Srolovitz, D. J. and Butler, J. E., 3-D atomistic kinetic Monte Carlo simulations of point defect incorporation during CVD diamond film growth. Materials Research Society Symposium Proceedings, 1997, 441, 509-514.
151. Baldwin Jr., S. K., Experimental investigation of atmospheric pressure nonequilibrium plasma chemistry for plasma assisted chemical vapor deposition of diamond thin films. HTGL Report T-326, Mechanical Engineering Department, Stanford University, 1996.
152. Medical technology: inside out. The Economist, 1999, 365, August 21, 71.
153. Skudarnov, P. V., Regel, L. L. and Wilcox, W. R., Flow visualization study of convection in a centrifuge. In Centrifugal Materials Processing L. L. Regel and W. R. Wilcox (eds), Plenum, New York, 1997, pp. 75-88.
154. Wilcox, W. R., Regel, L. L. and Arnold, W. A., Convection and segregation during vertical bridgman growth with centrifugation. Journal of Crystal Growth, 1998, 187, 543-558.
155. Skudarnov, P. V., Regel, L. L. and Wilcox, W. R., Visualization of convection in a simulated gradient freeze cell during centrifugation. Journal of Crystal Growth, 1998, 193, 219-229.
156. Skudarnov, P. V., Regel, L. L. and Wilcox, W. R., Numerical modeling and flow visualization in the gradient freeze configuration during centrifugation. In: Centrifugal Processing, L. L. Regel and W. R. Wilcox (eds), Kluwer, 2001 (to appear).
157. Skudarnov, P. V., Flow visualization and numerical modeling of the gradient freeze configuration during centrifugation. Ph.D. Dissertation, Clarkson University, 1999.
158. Wiedemeier, H., Regel, L. L. and Palosz, W., Vapor transport and crystal growth of GeSe under normal and high acceleration. Journal of Crystal Growth, 1992, 119, 79-83.