Advancements in focused ion beam repair of MoSiON phase shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 609-622

  Lessing, Joshua ^a   Ferranti, David ^a   Sundaram, Ganesh ^a   Nagl, Ludwig ^a   Verbeek, Martin ^a  

^a Micrion Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; ION BEAM LITHOGRAPHY; MOLYBDENUM COMPOUNDS; PHASE SHIFT; PHOTOLITHOGRAPHY; SEMICONDUCTING GALLIUM; SPUTTERING;

FOCUSED ION BEAM (FIB) REPAIR; PHASE SHIFT MASKS (PSM);

MASKS;

EID: 0032685593     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360232     Document Type: Conference Paper

References (3)