Focused ion beam biased repair of conventional and phase shift masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3942-3946

  Cui, Zheng ^a   Prewett, Philip D ^a   Watson, John G ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005105826     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588700     Document Type: Article

References (7)

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3. L. R. Harriott, J. G. Garofalo, and R. L. Kostelak, SPIE 1671, 224 (1992).
4. P. D. Prewett, A. W. Eastwood, G. S. Turner, and J. G. Watson, Microelectron. Eng. 21, 191 (1993).
5. H. Nakamura, H. Komano, and M. Ogasawara, Jpn. J. Appl. Phys. 31, 4465 (1992).
6. W. Henke and G. Czech, Microelectron. Eng. 11, 629 (1989).
7. P. D. Prewett, Z. Cui, and J. G. Watson, SPIE 2439, 221 (1995).