Progress for characterization and advanced reticle repair

Solid State Technology

Volumn 43, Issue 7, 2000, Pages 195-201

  Morgan, John ^a   Mormon, Troy ^b  

^a Thermo Fisher Scientific   (United States)

^b Surface/Interface Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ION BEAMS; LITHOGRAPHY; REPAIR; SPATIAL VARIABLES MEASUREMENT; TECHNOLOGY TRANSFER;

ADVANCED RETICLE REPAIR; FOCUSED ION BEAM SYSTEM; STYLUS NANOPROFILOMETRY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0343442396     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (1)

1. J. B. Bindeil, et al., Stylus NanoProfilometry: A new approach to CD metrology," Solid State Technology, pp. 45-53, June 1999.