Electrical and Chemical Characterization of FIB-Deposited Insulators

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn 1997-October, Issue , 1997, Pages 223-230

  Campbell, Ann N ^a   Tanner, D M ^a   Soden, J M ^a   Stewart, D K ^b   Doyle, A ^b   Adams, E ^c   Gibson, M ^c   Abramo, M ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Micrion Corp   (United States)

^c IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITANCE MEASUREMENT; CHEMICAL ANALYSIS; DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAMS; MIS DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

CAPACITOR STRUCTURES; CHEMICAL CHARACTERIZATION; CODEPOSITION; DEPOSITED INSULATOR; EFFECTIVE RESISTANCES; ELECTRICAL CHARACTERIZATION; FOCUSED IONS BEAMS; FOCUSED-ION-BEAM SYSTEM; METAL CAPACITORS; METAL INSULATOR METALS;

METAL INSULATOR BOUNDARIES;

EID: 84926151472     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.31399/asm.cp.istfa1997p0223     Document Type: Conference Paper

References (11)

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