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Volumn 616, Issue , 2000, Pages 21-26

Chemical vapor deposition coating for micromachines

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; POLYSILICON; PROCESS CONTROL; REDUCTION; STICTION; TUNGSTEN; WEAR OF MATERIALS;

EID: 0034448080     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-616-21     Document Type: Conference Paper
Times cited : (6)

References (20)
  • 6
    • 0032098108 scopus 로고    scopus 로고
    • Adhesion and friction issues associated with reliable operation of MEMS
    • June
    • (1998) MRS Bulletin , pp. 47-51
    • Maboudian, R.1
  • 14
    • 0002922252 scopus 로고
    • Deposition and Growth: Limits for Microelectronics
    • edited by G. W. Rubloff (AIP Conf. Proc. 167, New York)
    • (1988) , pp. 202
    • Yu, M.L.1    Eldridge, B.N.2    Joshi, R.V.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.