Elimination of post-release adhesion in microstructures using thin conformal fluorocarbon films

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1996, Pages 55-60

  Man, P F ^a   Gogoi, B P ^a   Mastrangelo, C H ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; COATINGS; FLUOROCARBONS; GROWTH (MATERIALS); MICROSTRUCTURE; MONOMERS; PLASMAS; POLYMERIZATION; SEMICONDUCTING SILICON; SUBSTRATES; SURFACES;

CONFORMAL DEPOSITION; DECAFLUOROBUTANE; DEFORMABLE MIRROR DEVICES; FLUORINE TO CARBON RATIO; HYDROPHOBIC FLUOROCARBON FILM; PLASMA POLYMERIZATION; PLASMA REACTOR; POLYMERIZED TETRAFLUOROETHYLENE FILMS;

THIN FILMS;

EID: 0029751904     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (31)