In situ electron-spin-resonance measurements of film growth of hydrogenated amorphous silicon

Applied Physics Letters

Volumn 70, Issue 9, 1997, Pages 1137-1139

  Yamasaki, Satoshi ^a,b   Umeda, Takahide ^a,c   Isoya, Junichi ^a,c   Tanaka, Kazunobu ^a,c  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000228489     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119073     Document Type: Article

References (12)

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