Improved etching characteristics of silicon-dioxide by enhanced inductively coupled plasma

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 589-592

  O, Beom hoan ^a   Park, Se Geun ^a   Rha, Sang Ho ^a   Jeong, Jae Seong ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBONS; MAGNETIC FIELD EFFECTS; PHOTORESISTS; PLASMA DENSITY; PLASMA ETCHING; PLASMA SOURCES; SILICA;

PLANAR INDUCTIVELY COUPLED PLASMA;

SEMICONDUCTING SILICON COMPOUNDS;

ETCHING;

EID: 0034318450     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00900-2     Document Type: Article

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