Reduction of loading effect in reactive ion etching using real-time closed-loop control

Journal of the Electrochemical Society

Volumn 144, Issue 8, 1997, Pages 2865-2871

  Patterson, Oliver D ^a   Khargonekar, Pramod P ^a  

^a Department of Ecology and Evolutionary Biology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; FEEDBACK CONTROL; MATHEMATICAL MODELS; REAL TIME SYSTEMS;

CARBON TETRAFLUORIDE; LOADING EFFECT; POLYSILICON;

REACTIVE ION ETCHING;

EID: 0031207310     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837909     Document Type: Article

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