Chemical vapor deposition based preparation on porous silica films

Japanese journal of applied physics

Volumn 39, Issue 11 B, 2000, Pages

  Uchida, Yasutaka ^a   Katoh, Takashi ^a   Sugahara, Satoshi ^b   Matsumura, Masakiyo ^b  

^a TEIKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DESORPTION; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; PERMITTIVITY; POROSITY; POROUS MATERIALS; SILICA;

POROUS SILICA FILMS;

DIELECTRIC FILMS;

EID: 0034315103     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l1155     Document Type: Article

References (9)

1. D. Tobben, P. Weigand, M. J. Shapiro and S. A. Cohen: Mater. Res. Soc Symp. Proc. 443 (1997) 195.
2. C. Jin, S. List and E. Zielinski: Mater. Res. Soc. Symp. Proc. 511 (1998) 213.
3. T. Ramos, K. Rhoderick, R. Roth, L. Brungardt, S. Wallace, J. Drage, J. Dunne, D. Endisch, R. Katsanes, N. Viernes and D. M. Smith: Mater. Res. Soc. Symp. Proc. 511 (1998) 105.
4. Y. Uchida, S. Takei and M. Matsumura: Jpn. J. Appl. Phys. 36 (1997) 1509.
5. Y. Uchida, K. Taguchi, T. Nagai, S. Sugahara and M. Matsumura: Jpn. J. Appl. Phys. 37 (1998) 6369.
6. Y. Uchida, K. Taguchi, S. Sugahara and M. Matsumura: Jpn J. Appl Phys. 38 (1999) 2368.
7. Y. Uchida, K. Taguchi and M. Matsumura: J. Non-Cryst. Solids 254 (1999) 11.
8. Y. Sano, K. Usami, S. Sugahara, T. Hattori and M. Matsumura: Ext. Abstr. (59th Autumn Meet. 1998); The Japan Society of Applied Physics, 17p-ZG-9.
9. C. Jin, J. D. Luttmer, D. M. Smith and T. A. Ramos: Mater. Res. Bull. 22 (1997) 39.