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Volumn 68, Issue 1, 2000, Pages 223-233

Design and fabrication of high-temperature micro-hotplates for drop-coated gas sensors

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON MONOXIDE; COATING TECHNIQUES; DESIGN; FABRICATION; HIGH TEMPERATURE EFFECTS; METHANE; THIN FILMS;

EID: 0034249624     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00433-0     Document Type: Article
Times cited : (176)

References (19)
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    • A substrate for thin-film gas sensors in microelectronic technology
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  • 3
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    • A CMOS thermally isolated heater structure as a substrate for semiconductor gas sensor
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    • (1992) Microelectronics Journal , vol.23 , pp. 451-456
    • Wessel, S.1    Parameswaran, M.2    Morrison, S.R.3    Frindt, R.F.4
  • 4
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    • Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing
    • Suehle J.S., Cavicchi R.E., Gaitan M., Semancik S. Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing. IEEE Electron Device Letters. 14(3):1993;118-120.
    • (1993) IEEE Electron Device Letters , vol.14 , Issue.3 , pp. 118-120
    • Suehle, J.S.1    Cavicchi, R.E.2    Gaitan, M.3    Semancik, S.4
  • 5
    • 0041577551 scopus 로고    scopus 로고
    • Optimized temperature-pulse sequences for the enhancement of chemically specific response patterns from micro-hotplates gas sensors
    • Cavicchi R.E., Suehle J.S., Kreider K.G., Gaitan M., Chaparala P. Optimized temperature-pulse sequences for the enhancement of chemically specific response patterns from micro-hotplates gas sensors. Sensors and Actuators, B. 33:1996;142-146.
    • (1996) Sensors and Actuators, B , vol.33 , pp. 142-146
    • Cavicchi, R.E.1    Suehle, J.S.2    Kreider, K.G.3    Gaitan, M.4    Chaparala, P.5
  • 10
    • 0026171127 scopus 로고
    • The Si planar pellistor: A low-power pellistor sensor in Si thin-film technology
    • Gall M. The Si planar pellistor: a low-power pellistor sensor in Si thin-film technology. Sensors and Actuators, B. 4:1991;533-538.
    • (1991) Sensors and Actuators, B , vol.4 , pp. 533-538
    • Gall, M.1
  • 15
    • 0030260406 scopus 로고    scopus 로고
    • Maskless etching of three-dimensional silicon structures in KOH
    • Li X., Bao M., Shen S. Maskless etching of three-dimensional silicon structures in KOH. Sensors and Actuators, A. 57:1996;47-52.
    • (1996) Sensors and Actuators, a , vol.57 , pp. 47-52
    • Li, X.1    Bao, M.2    Shen, S.3
  • 18
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    • Thermophysical properties of low-residual stress silicon rich LPCVD silicon nitride films
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    • Mastrangelo, C.H.1    Chong, Y.-C.2    Muller, R.S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.