Thin-film gas sensor implemented on a low-power-consumption micromachined silicon structure

Sensors and Actuators, B: Chemical

Volumn 49, Issue 1-2, 1998, Pages 88-92

  Guidi, Vincenzo ^a   Cardinali, Gian Carlo ^b   Dori, Leonello ^b,d   Faglia, Guido ^c   Ferroni, Matteo ^a   Martinelli, Giuliano ^a   Nelli, Paolo ^c   Sberveglieri, Giorgio ^c  

^a UNIVERSITY OF FERRARA   (Italy)

^b CNR   (Italy)

^c UNIVERSITY OF BRESCIA   (Italy)

^d IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Gas sensor; Micromachining; MoO3

Indexed keywords

ELECTRON MICROSCOPY; MOLYBDENUM COMPOUNDS; NITROGEN COMPOUNDS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LOWER POWER CONSUMPTION; NITROGEN DIOXIDE; THIN FILM GAS SENSOR;

ELECTROCHEMICAL SENSORS;

EID: 0032090665     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(98)00039-2     Document Type: Article

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