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Volumn 15, Issue 8, 2000, Pages 836-839
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Epitaxial growth of yittria-stabilized zirconia oxide thin film on natively oxidized silicon wafer without an amorphous layer
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
CRYSTALLINE MATERIALS;
DEPOSITION;
EPITAXIAL GROWTH;
INTERFACES (MATERIALS);
PARTIAL PRESSURE;
PRESSURE EFFECTS;
PULSED LASER APPLICATIONS;
SILICON WAFERS;
THIN FILMS;
YTTRIUM COMPOUNDS;
ZIRCONIA;
PULSED LASER DEPOSITION;
SEMICONDUCTING FILMS;
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EID: 0034247599
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/15/8/309 Document Type: Article |
Times cited : (36)
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References (18)
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