Heteroepitaxial growth of yttria-stabilized zirconia film on oxidized silicon by reactive sputtering

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 28-31

  Horita, Susumu ^a   Abe, Yukinari ^a   Kawada, Tsuyoshi ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Heteroepitaxial growth; Reactive sputtering; Yttria stabilized zirconia

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; FILM PREPARATION; METALLIC FILMS; OXIDATION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON; SPUTTERING; SURFACE ROUGHNESS; THIN FILMS; YTTRIUM COMPOUNDS; ZIRCONIA;

HETEROEPITAXIAL GROWTH; REACTIVE SPUTTERING; YTTRIA STABILIZED ZIRCONIA;

FILM GROWTH;

EID: 3743140831     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08567-7     Document Type: Article

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