Energy distribution functions of ions impacted on a negatively biased substrate in an electron cyclotron resonance microwave plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4393-4396

  Ohtsu, Yasunori ^a   Mori, Keiichi ^a   Fujita, Hiroharu ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LEVELS; MOLECULAR DYNAMICS; PLASMAS; PRESSURE; SUBSTRATES; TEMPERATURE;

GAS PRESSURE; HIGH BIASED VOLTAGE; IMPACTED ION ENERGY DISTRIBUTION FUNCTIONS; ION NEUTRAL COLLISIONS; RETARDING GRID ANALYZER; SUBSTRATE SHEATH;

IONS;

EID: 0033157621     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4393     Document Type: Article

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