Controlled deposition of carbon nanotubes on a patterned substrate

Surface Science

Volumn 462, Issue 1, 2000, Pages 195-202

  Choi, K H ^a   Bourgoin, J P ^a   Auvray, S ^a   Esteve, D ^b   Duesberg, G S ^c   Roth, S ^c   Burghard, M ^c  

^a CEA SACLAY   (France)

^b SERVICE DE PHYSIQUE DE L ETAT CONDENSÉ   (France)

^c MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; NANOTUBES; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILANES;

CARBON NANOTUBES;

CARBON;

EID: 0034244821     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00609-9     Document Type: Article

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