Removal of contamination and oxide layers from UHV-AFMtips

Applied Physics A: Materials Science and Processing

Volumn 66, Issue SUPPL. 1, 1998, Pages

  Arai, T ^a   Tomitori, M ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AFM CANTILEVERS; AFM IMAGE; AFM TIP; AUGER ELECTRON; OXIDE LAYER; PIEZO-RESISTIVE; PROTECTIVE THIN; TIP SURFACES;

DESORPTION; FIELD EMISSION; MICROSCOPES; NANOCANTILEVERS; NANOPROBES; ULTRAHIGH VACUUM;

ATOMIC FORCE MICROSCOPY;

EID: 0039672815     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s003390051154     Document Type: Article

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