Piezoresistive sensors for scanning probe microscopy

Ultramicroscopy

Volumn 82, Issue 1-4, 2000, Pages 39-48

  Gotszalk, Teodor ^a   Grabiec, Piotr ^a   Rangelow, Ivo W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

Author keywords

Atomic force microscopy; Piezoresistive cantilever; Scanning probe microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALORIMETERS; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; FINITE ELEMENT METHOD; MICROELECTRONICS; MICROSENSORS; OPTICAL MICROSCOPY; PROBES; SCANNING TUNNELING MICROSCOPY; SILICON SENSORS;

FEMTOCALORIMETER; LATERAL FORCE MICROSCOPY; PIEZORESISTIVE SENSORS; SCANNING CAPACITANCE MICROSCOPY; SCANNING PROBE MICROSCOPY;

PIEZOELECTRIC TRANSDUCERS;

ARTICLE; ATOMIC FORCE MICROSCOPY; FINITE ELEMENT ANALYSIS; MICROANALYSIS; OPTICAL RESOLUTION; PIEZOELECTRICITY; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SENSOR; SIMULATION; SYNTHESIS; TEMPERATURE MEASUREMENT; VALIDATION PROCESS;

EID: 0033973106     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(99)00171-0     Document Type: Article

References (23)

1. Binnig G., Rohrer H. Helv. Phys. Acta. 55:1982;726.
2. Binnig G., Quate C.F., Gerber Ch. Phys. Rev. Lett. 56:1986;930.
3. Mate M., McClelland G., Erlandsson R., Chiang S. Phys. Rev. Lett. 59:1987;1942.
4. I.W. Rangelow, Deep Etching of Silicon, Politechnika, 1996, ISBN83-7085-254-8.
5. M. Tortonese, H. Yamada, R.C. Barett, C.F. Quate, IEEE, 91CH2817-5, 1991, p. 448.
6. Linnemann R., Gotszalk T., Hadjiiski L., Rangelow I.W. Thin Solid Films. 264:1995;159.
7. Linnemann R., Gotszalk T., Rangelow I.W., Dumania P. J. Vac. Sci. Technol. B. 14:1996;856.
8. T. Gotszalk, I.W. Rangelow, P. Dumania, P. Grabiec, Micromachining and microfabrication process technology II, Proceedings of SPIE, Vol. 2880, 1996, p. 256.
9. T. Gotszalk, I.W. Rangelow, P. Dumania, P. Grabiec, Micromachining and microfabrication process technology II, Proceedings of SPIE, Vol. 2880, 1996, p. 264.
10. T. Gotszalk, R. Linnemann, I.W. Rangelow, P. Dumania, P. Grabiec, Metal/nonmetal microsystems: physics, technology, and applications, Proceedings of SPIE, Vol. 2780, 1996, 376.
11. Gotszalk T., Linnemann R., Rangelow I.W., Dumania P., Grabiec P. Int. J. Electron. 81:1996;473.
12. I.W. Rangelow, T. Gotszalk, P. Dumania, P. Grabiec, PTB-Bericht F-21, 1995, p. 36.
13. Gotszalk T., Shi F., Grabiec P., Dumania P., Rangelow I.W. Microelectron Eng. 41/42:1998;477.
14. Rangelow I.W. Microelectron. Eng. 23:1994;369.
15. Gotszalk T., Shi F., Grabiec P., Hudek P., Dumania P., Rangelow I.W. MNE'97. Microelectron Eng. 41/42:1998;477-480.
16. Martin Y., Abraham D.W., Wickramasinghe H.K. Appl. Phys. Lett. 52:1988;13.
17. Barrett M., Dennis M., Tiffin D., Li Y., Shin C.K. J. Vac. Sci. Technol. B. 14:1996;447.
18. Huang Y., Wiliams C.C. J. Vac. Sci. Technol. B. 12:1994;369.
19. Gotszalk T., Shi F., Grabiec P., Dumania P., Hudek P., Rangelow I.W. J. Vac. Sci. Technol. B. 16(6):1998;3948.
20. McClelland G., Mate C., Erlandsson R., Chiang S. Mater. Res. Soc. Symp. Proc. 119:1988;81.
21. Grabiec P.B., Sunyk R., Shi F., Popovic G., Gotszalk T., Hudek P., Dumania P., Rangelow I.W. A design and fabrication of a 3D force sensitive microprobe for surface characterization. Microelectron. Eng. 46:1999;405.
22. R. Sunyk, P. Grabiec, T. Gotszalk, P. Hudek, F. Shi, W. Barth, T. Debski, I.W. Rangelow, A FEM-predicted design and fabrication of AFM advanced sensor for 3D surface characterization, EIPBN '99, Miami, J. Vac. Sci. Technol. (1999), to be published.
23. T. Gotszalk, N. Abedinov, W. Barth, E. Lorenz, P. Hudek, T. Debski, P. Janus, P.B. Grabiec, M. Zaborowski, I.W. Rangelow, MNE'1999, Rome, Italy; Microelectron. Eng., to be published.