Production and characterisation of carbon nitride thin films produced by a graphite hollow cathode system

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 228-232

  Muhl, Stephen ^a   Gaona Couto, Adriana ^a   Méndez, Juan Manuel ^a   Rodil, Sandra ^a   Gonzalez, Gonzalo ^a   Merkulov, Alexander ^b   Asomoza, Rene ^b  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Carbon nitride thin films; Chemical vapour deposition; Plasma power; Substrate bias

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

GRAPHITE HOLLOW CATHODE SYSTEMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0031248798     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00377-5     Document Type: Article

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