Negative resist profiles in 248 nm photolithography: Experiment, modelling and simulation

Semiconductor Science and Technology

Volumn 13, Issue 6, 1998, Pages 603-610

  Karafyllidis, I ^a   Hagouel, P I ^b   Neureuther, A R ^c  

^a DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

^b PO Box 10935 ^*  (Greece)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000205870     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/13/6/011     Document Type: Article

References (20)

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