Negative resist profiles of close-spaced parallel and isolated lines: Experiment, modelling and simulation

Microelectronic Engineering

Volumn 45, Issue 1, 1999, Pages 71-84

  Karafyllidis, I ^a   Hagouel, P I ^b   Neureuther, A R ^c  

^a DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

^b University of California ^*  (Greece)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Cellular automata; Etching; Photolithography; Resists

Indexed keywords

COMPUTER SIMULATION; ETCHING; SEMICONDUCTOR DEVICE MODELS; SILICON WAFERS; ULTRAVIOLET RADIATION;

CELLULAR AUTOMATA;

PHOTORESISTS;

EID: 0033076980     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00283-4     Document Type: Article

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