Simulation of deposition-topography granular distortion for TCAD

Modelling and Simulation in Materials Science and Engineering

Volumn 6, Issue 3, 1998, Pages 199-210

  Karafyllidis, I ^a   Georgoulas, N ^a   Hagouel, P I ^b   Thanailakis, A ^a  

^a DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

^b NONE   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

GRANULAR DEFECTS; TECHNOLOGY COMPUTER AIDED DESIGN (TCAD);

CRYSTAL DEFECTS;

EID: 0032066751     PISSN: 09650393     EISSN: None     Source Type: Journal    
DOI: 10.1088/0965-0393/6/3/001     Document Type: Article

References (25)

1. Walton A J, Fallon M, Newsam M I and Ferguson R S 1997 Total TCAD strategy for DFM in IC technology development IEE Proc Sci. 144 63-8
2. Bold B S 1996 An industrial perspective of technology CAD for advanced CMOS technologies Microelectron. Eng. 34 65-9
3. Hanson D A, Goossens R J G, Redford M and McGinty J 1996 Analysis of mixed-signal manufacturability with statistical technology CAD (TCAD) IEEE Trans. Semicond. Manufact. 9 478-88
4. D'Ignazio J 1996 TCAD tools leap hurdles to broader use, Semicond. Int. 19 99-106
5. Mar J 1995 Directions for technology CAD Proc. IEEE Region 10 Int. Conf. on Microelectronics and VLSI (Hong Kong) (New York: IEEE) pp 202-5
6. Axelrad V, Granik Y, Boksha V and Rollins J G 1994 Cost and yield estimation - a new TCAD component Proc. 24th Eur. Solid State Device Research Conf. (Edinburgh, UK) ed C Hill and P Ashburn (Gif sur Yvette: Editions Frontieres) pp 687-90
7. Plummer J D 1996 TCAD-the semiconductor industry roadmap and a path to the future Proc. 4th Int. Symp. Process Physics and Modeling in Semiconductor Technology (Los Angeles, CA, USA) ed G R Srinivasan, C S Murthy and S T Dunham (Pennington, NJ: Electrochem. Soc) pp 3-17
8. Buturla E M, Byers J, Husain A and Kump M 1995 The role of SEMATECH in enabling global TCAD collaboration Proc. 6th Int. Conf. on Simulation of Semiconductor Devices and Processes (Erlangen, Germany) ed H Ryssel and P Pichler (Wien, Austria: Springer) pp 163-5
9. Sahul Z H, Wang K C, Hsiau Z K, McKenna E W and Dutton R W 1996 Heterogenous process simulation tool integration IEEE Trans. Semicond. Manufact. 9 35-48
10. Wulu H C, Saraswat K C and McVittie J P 1991 Simulation of mass transport for deposition in via holes and trenches J. Electrochem. Soc. 138 1831-40
11. McVittie J P, Rey J C, Cheng L Y, IslamRaja M M and Saraswat K C 1995 Optimization of internal dielectric deposition module using simulation J. Vac. Sci. Technol. 13 1867-74
12. Ikegawa M and Kobayashi J 1989 Deposition profile simulation using the direct simulation Monte Carlo Method J. Electrochem. Soc. 136 2982-9
13. Tazawa S, Ochiai K, Matsuo S and Nakajima S 1997 A high-speed 2-D topography simulator based on a pixel model IEEE Trans. Comput. Aided Des. Integrated Circuits Syst. 16 386-97
14. Hsiau Z K, Kan E C, McVittie J P and Dutton R W 1997 Robust, stable and accurate boundary movement for physical etching and deposition simulation IEEE Trans. Electron Devices 44 1375-85
15. Tazawa S, Matsuo S and Saito K 1992 A general characterization and simulation method for deposition and etching technology IEEE Trans. Semicond. Manufact. 5 27-36
16. Sethian J A 1985 Curvature and evolution of fronts Commun. Math. Phys. 101 487-99
17. Chopard B and Droz M 1991 Cellular automata model for the diffusion equation J. Stat. Phys. 64 859-92
18. Danikas M G, Karafyllidis I, Thanailakis A and Bruning A M 1996 Simulation of electrical tree growth in solid dielectrics containing voids of arbitrary shape Modelling Simulation Mater. Sci. Eng. 4 535-52
19. Chen H, Matthaeus W H and Klein L W 1990 Theory of multicolor lattice gas: a cellular automaton Poisson solver J. Comput. Phys. 88 433-66
20. Bialynicki-Birula I 1994 Weyl, Dirac, and Maxwell equations on a lattice as unitary cellular automata Phys. Rev. D 49 6920-7
21. Karafyllidis I and Thanailakis A 1995 Simulation of the two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata Modelling Simulation Mater. Sci. Eng. 3 629-42
22. Karafyllidis I and Thanailakis A 1996 Simulation of the image reversal submicron process in integrated circuit fabrication Semicond. Sci. Technol. 11 214-20
23. Karafyllidis I 1997 Simulation of the negative chemical amplification deep-ultraviolet process in integrated circuit fabrication Microelectron. Eng. 34 155-170
24. Schönfisch, B 1995 Propagation of fronts in cellular automata Physica D 80 433-50
25. Karafyllidis I and Thanailakis A 1997 A model for predicting forest fire spreading using cellular automata Ecolog. Model. 99 87-97