Developer temperature effect on negative deep ultraviolet resists: Characterization, modeling, and simulation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2616-2620

  Hagouel, Paul Isaac ^a   Karafyllidis, Ioannis ^b   Neureuther, Andrew R ^c  

^a Democritus University of Thrace ^*  (Greece)

^b DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001368709     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589695     Document Type: Article

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