Simulation of the image reversal submicron process in integrated circuit fabrication

Semiconductor Science and Technology

Volumn 11, Issue 2, 1996, Pages 214-220

  Karafyllidis, Ioannis ^a   Thanailakis, Adonios ^a  

^a DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; AUTOMATA THEORY; COMPUTER SIMULATION; FABRICATION; GEOMETRY; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTORESISTS;

CELLULAR AUTOMATA; IMAGE REVERSAL SUBMICRON PROCESS; OPTICAL LITHOGRAPHY SIMULATION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0030086631     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/2/012     Document Type: Article

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