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Volumn 124, Issue 2-3, 2000, Pages 210-221

Enhancement of mechanical properties of TiN/AlN multilayers by modifying the number and the quality of interfaces

Author keywords

Interfacial roughness; Ion bombardment; Mechanical properties; Reactive sputtering; TiN AlN multilayers

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; ETCHING; HARDNESS; INTERFACES (MATERIALS); ION BOMBARDMENT; MORPHOLOGY; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TITANIUM NITRIDE; WEAR RESISTANCE;

EID: 0033886954     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00655-6     Document Type: Article
Times cited : (36)

References (63)
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    • J.L. Vossen, & W. Kern. New York: Academic Press
    • Vossen J.L., Cuomo J.J. Vossen J.L., Kern W. Thin Film Processes. 1978;207 Academic Press, New York.
    • (1978) Thin Film Processes , pp. 207
    • Vossen, J.L.1    Cuomo, J.J.2
  • 61
    • 0040284394 scopus 로고
    • J.J. Cuomo, S.M. Rossnagel, & H.R. Kaufman. Park Ridge, NJ: Noyes Publications
    • Roy R.A., Yee A. Cuomo J.J., Rossnagel S.M., Kaufman H.R. Handbook of Ion Beam Technology. 1989;194 Noyes Publications, Park Ridge, NJ.
    • (1989) Handbook of Ion Beam Technology , pp. 194
    • Roy, R.A.1    Yee, A.2
  • 62
    • 0040596389 scopus 로고
    • T.S. Moss, & S.P. Keller. Amsterdam: North Holland Publishing Company
    • Greene J.E. Moss T.S., Keller S.P. Handbook of Semiconductors. 1980;499 North Holland Publishing Company, Amsterdam.
    • (1980) Handbook of Semiconductors , pp. 499
    • Greene, J.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.