Deposition and characterization of multilayered TiN/ZrN coatings

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 124-128

  Tavares, C J ^a   Rebouta, L ^a   Almeida, B ^b   Bessa E Sousa, J ^b   Da Silva, M F ^c   Soares, J C ^d  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITY OF PORTO   (Portugal)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^d CENTRO DE FÍSICA NUCLEAR DA UNIVERSIDADE DE LISBOA   (Portugal)

Author keywords

Magnetron sputtering; RBS; X ray diffraction

Indexed keywords

COMPUTER SIMULATION; FILM GROWTH; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; NITRIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SURFACE ROUGHNESS; X RAY DIFFRACTION;

INTERFACIAL ROUGHNESS; NITRIDE FILM;

MULTILAYERS;

EID: 0032051026     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00607-X     Document Type: Article

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