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Volumn 161, Issue , 2000, Pages 1038-1042

He-induced cavity formation in silicon upon high-temperature implantation

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HELIUM; HIGH TEMPERATURE OPERATIONS; MICROSTRUCTURE; NUCLEATION; RADIATION EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0033885661     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00888-5     Document Type: Article
Times cited : (19)

References (16)
  • 12
    • 0004198677 scopus 로고
    • W. Chu, J.W. Mayer, M.A. Nicolet (Eds.), Academic Press, New York
    • W. Chu, J.W. Mayer, M.A. Nicolet (Eds.), Backscattering Spectrometry, Academic Press, New York, 1978.
    • (1978) Backscattering Spectrometry


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.