Helium-implanted silicon: A study of bubble precursors

Journal of Applied Physics

Volumn 85, Issue 3, 1999, Pages 1401-1408

  Corni, F ^a   Calzolari, G ^a   Frabboni, S ^a   Nobili, C ^a   Ottaviani, G ^a   Tonini, R ^a   Cerofolini, G F ^b   Leone, D ^c   Servidori, M ^c   Brusa, R S ^d   Karwasz, G P ^d   Tiengo, N ^d   Zecca, A ^d  

^a UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^b STMICROELECTRONICS   (Italy)

^c CNR   (Italy)

^d UNIVERSITY OF TRENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000426691     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369335     Document Type: Article

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