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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 1, 2000, Pages 275-276

Surface roughness of hydrogen ion cut low temperature bonded thin film layers

(2) Li, Y Albert a Bower, Robert W a

a University of California Davis (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; HYDROGEN; ION IMPLANTATION; LOW TEMPERATURE OPERATIONS; NANOSTRUCTURED MATERIALS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; THIN FILMS;

ION CUT; SMART CUT; WAFER DELAMINATION; WAFER SPLITTING;

SURFACE ROUGHNESS;

EID: 0033872103 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.39.275 Document Type: Article

Times cited : (6)

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