Effect of polymer architecture on the aqueous base development of photoresists

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Volumn 40, Issue 1, 1999, Pages 438-439

  Barclay, G G ^a   King, M A ^a   Mao, Z ^a   Szmanda, C ^a   Benoit, D ^a   Malmstrom, E ^a   Ito, H ^a   Hawker, C J ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; MOLECULAR STRUCTURE; PHOTORESISTS; POLYACRYLATES; POLYSTYRENES;

AQUEOUS BASE DISSOLUTION; HYDROPHOBICITY; HYDROXYSTYRENE COPOLYMERS;

GRAFT COPOLYMERS;

EID: 0033095268     PISSN: 00323934     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)