Chemical force microscopy of -CH3 and -COOH terminal groups in mixed self-assembled monolayers by pulsed-force-mode atomic force microscopy

Applied Surface Science

Volumn 157, Issue 4, 2000, Pages 398-404

  Okabe, Yoh ^a   Akiba, Uichi ^a   Fujihira, Masamichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVES; ATOMIC FORCE MICROSCOPY; SURFACE TOPOGRAPHY;

CHEMICAL FORCE MICROSCOPY; PULSED FORCE MODE ATOMIC FORCE MICROSCOPY (PFM-AFM); SELF-ASSEMBLED MONOLAYERS (SAM);

MONOLAYERS;

EID: 0033731375     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00557-7     Document Type: Article

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