Extendibility of Ta2O5 metal-insulator-metal capacitor using Ru electrode

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 4 B, 2000, Pages 2073-2077

  Tsuzumitani, Akihiko ^a   Okuno, Yasutoshi ^a   Shibata, Jun ^a   Shimizu, Tadami ^a   Yamamoto, Kazuhiko ^a   Mori, Yoshihiro ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Capacitor; Cylindrical structure; DRAM; H2; Metal insulator metal; Ru; Ta2O5; Thin dielectrics

Indexed keywords

ANNEALING; DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC PROPERTIES; ELECTRODES; LEAKAGE CURRENTS; OXIDE SUPERCONDUCTORS; TEMPERATURE;

METAL INSULATOR METAL CAPACITOR; TEMPERATURE DEPENDENCE;

CAPACITORS;

EID: 0033687716     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.2073     Document Type: Article

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