Ultrathin Ta2O5 film capacitor with Ru bottom electrode

Journal of the Electrochemical Society

Volumn 145, Issue 8, 1998, Pages 2961-2964

  Aoyama, Tomonori ^a   Yamazaki, Soichi ^a   Imai, Keitaro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTROCHEMICAL ELECTRODES; HEAT TREATMENT; LEAKAGE CURRENTS; NITROGEN; OXYGEN; PLASMA APPLICATIONS; RANDOM ACCESS STORAGE; RUTHENIUM; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; ULTRATHIN FILMS;

TANTALUM PENTOXIDE;

CAPACITORS;

EID: 0032139952     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838745     Document Type: Article

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