Electrical properties of rare earth silicides produced by channeled ion beam synthesis

Microelectronic Engineering

Volumn 50, Issue 1-4, 2000, Pages 211-215

  Hogg, S M ^a   Vantomme, A ^a   Wu, M F ^a   Langouche, G ^a  

^a KU LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; ERBIUM COMPOUNDS; ION IMPLANTATION; MAGNETIZATION; MOLECULAR BEAM EPITAXY; YTTRIUM COMPOUNDS;

CHANNELED ION BEAM SYNTHESIS; ERBIUM DISILICIDE; ERBIUM YTTRIUM SILICIDE; YTTRIUM DISILICIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0033639861     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00284-1     Document Type: Article

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