Microscopic modeling of InP etching in CH4-H2 plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2598-2606

  Houlet, L ^a   Rhallabi, A ^a   Turban, G ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033425651     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581918     Document Type: Article

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