Surface modification and etch product detection during reactive ion etching of InP in Ch4-H2 plasma

Plasma Sources Science and Technology

Volumn 6, Issue 3, 1997, Pages 334-342

  Feurprier, Y ^a   Cardinaud, Ch ^a   Turban, G ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; EMISSION SPECTROSCOPY; HYDROGEN; MASS SPECTROMETRY; METHANE; PLASMA INTERACTIONS; REACTION INJECTION MOLDING; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM PHOSPHIDE; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ETCH PRODUCTS; PLASMA SURFACE INTERACTION;

PLASMA ETCHING;

EID: 0031212431     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/3/010     Document Type: Article

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