A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition

Computational Materials Science

Volumn 10, Issue 1-4, 1998, Pages 116-126

  Flicstein, J ^a   Pata, S ^a   Le Solliec, J M ^a   How Kee Chun, L S ^a   Palmier, J F ^a   Courant, J L ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; MONTE CARLO METHODS; NUCLEATION; PHOTOCHEMICAL REACTIONS;

PHOTODEPOSITION; PHOTONUCLEATION;

SILICON NITRIDE;

EID: 0032000974     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0256(97)00173-0     Document Type: Article

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