Enhancement of mask selectivity in SiO2 etching with a phase-controlled pulsed inductively coupled plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2349-2353

  Shin, Kyoung Sub ^a   Chi, Kyeong Koo ^a   Kang, Chang Jin ^a   Jung, Chul ^a   Jung, Chan Ouk ^a   Moon, Joo Tae ^a   Lee, Moon Yong ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

C2 (516.5nm) line; Emission intensity; Mask selectivity; Plasma potential distribution; Polymerization; Pulse plasma; QMS; SiO2 etching; VDC

Indexed keywords

MASKS; MASS SPECTROMETERS; PHASE MODULATION; PHOTORESISTS; PLASMA PROBES; POLYMERIZATION; SILICA;

ENERGY SPECTROSCOPIC QUADRUPOLE MASS SPECTROMETERS (QMS); MASK SELECTIVITY; PHASE CONTROLLED PULSED INDUCTIVELY COUPLED PLASMAS; PLASMA POTENTIAL DISTRIBUTIONS;

PLASMA ETCHING;

EID: 0032049152     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2349     Document Type: Article

References (15)

1. S. Samukawa: Jpn. J. Appl. Phys. 32 (1993) 6080.
2. S. Samukawa: Jpn. J. Appl. Phys. 33 (1994) 2133.
3. S. Samukawa: Appl. Phys. Lett. 68 (1996) 316.
4. K. Takahashi, M. Hori, S. Kishimoto and T. Goto: Jpn. J. Appl. Phys. 33 (1994) 4181.
5. Y. Chinzei, H. Shindo and Y. Horiike: Jpn. J. Appl. Phys. 35 (1996) 3585.
6. N. Fujiwara, T. Maniyama and M. Yoneda: Jpn. J. Appl. Phys. 34 (1995) 2095.
7. R. W. Boswell and R. K. Porteous: J. Appl. Phys. 62 (1997) 3123.
8. A. Yokozawa, H. Ohtake and S. Samukawa: Proc. 17th Dry Process Symp., Tokyo, 1995 (The Institute of Electrical Engineers of Japan, Tokyo, 1995) p. 27.
9. S. Ashida, C. Lee, M. R. Shim and M. A. Liberman: Proc. 17th Dry Process Symp. Tokyo, 1995 (The Institute of Electrical Engineers of Japan, Tokyo, 1995) p. 21.
10. J. H. Hahm, K. K. Chi, C. O. Jung, Y. B. Koh and M. Y. Lee: Jpn. J. Appl. Phys. 36 (1997) 2450.
11. T. H. Ahn, K. Nakamura and H. Sugai: Proc. 17th Dry Process Symp., Tokyo, 1995 (The Institute of Electrical Engineers of Japan, Tokyo, 1995) p. 57.
12. N. Fujiwara: Proc. 17th Dry Process Symp., Tokyo, 1995 (The Institute of Electrical Engineers of Japan, Tokyo, 1995) p. 51.
13. K. K. Chi, H. S. Shin, W. J. Yoo, C. O. Jung, Y. B. Koh and M. Y. Lee: Proc. 17th Dry Process Symp., Tokyo, 1995 (The Institute of Electrical Engineers of Japan, Tokyo, 1995) p. 75.
14. T. Ono, R. Hamasaki and T. Mizutani: Proc. 17th Dry Process Symp., Tokyo, 1995 (The Institute of Electrical Engineers of Japan, Tokyo, 1995) p. 219.
15. T. Maruyama, N. Fujiwara, K. Siozawa and M. Yoneda: Jpn. J. Appl. Phys. 35 (1996) 2463.