Stripping and cleaning of photoresist using low energy neutrals

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2419-2424

  Tang, Xianmin ^a   Nichols, C A ^b   Manos, D M ^a  

^a The College of William and Mary   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001662949     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371070     Document Type: Article

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