Nanometer Electron Beam lithography

NEC Research and Development

Volumn 40, Issue 4, 1999, Pages 388-392

  Ochiai, Yukinori ^a   Manako, Shoko ^a   Fujita, Jun Ichi ^a   Nomura, Eiichi ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR WEIGHT; NANOTECHNOLOGY; POLYSTYRENES;

CALIXARENES; RESIST RESINS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033340091     PISSN: 0547051X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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6. N. Mita, US Patent No. 5, 143, p. 784, 1992.
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8. J. Fujita, et al., "Ultrahigh Resolution of Calixarene Negative Resist in Electron Beam Lithography," Appl. Phys. Lett., 68, pp. 1297-1299, 1996.
9. S. Manako, et al., "Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography," Jpn. J. Appl. Phys., 36, pp. L724-L726, 1997.
10. S. Manako, et al., "Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650," Jpn. J. Appl. Phys., 37, pp. 6785-6787, 1998.
11. J. Fujita, et al., "Calixarene Electron Beam Resist for Nano-Lithography," Jpn. J. Appl. Phys., 36, pp. 7769-7772, 1997.
12. J. Fujita, et al., "Nanometer-Scale Resolution of Calixarene Negative Resist in Electron Beam Lithography," J. Vac. Sci. Technol., B14, pp. 4272-4276, 1996.
13. Y. Ochiai, et al., "High Resolution Organic Resists for Charged Particle Lithography," J. Vac. Sci. Technol., 17, pp. 933-938, 1999.