Resolution-limit study of chain-structure negative resist by electron beam lithography

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 6 A, 1997, Pages

  Manako, Shoko ^a   Fujita, Jun ichi ^a   Ochiai, Yukinori ^a   Nomura, Eiichi ^a   Matsui, Shinji ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MOLECULAR STRUCTURE; MOLECULAR WEIGHT;

CHAIN STRUCTURE; RESIST RESOLUTION LIMIT;

POLYSTYRENES;

EID: 0031162845     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l724     Document Type: Article

References (10)