Correlation between stress profiles of cubic boron nitride thin films and the phase sequence revealed from infrared data

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 6, 1999, Pages 653-656

  Klett, A ^a   Malave A ^a   Freudenstein, R ^a   Plass, M F ^a   Kulisch, W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CUBIC BORON NITRIDE; DEPOSITION; ETCHING; FILM GROWTH; GRAIN BOUNDARIES; ION BEAMS; SILICON WAFERS; STRESS ANALYSIS; STRESS CONCENTRATION; STRESS RELAXATION; THIN FILMS;

ION BEAM-ASSISTED DEPOSITION (IBAD);

CERAMIC COATINGS;

EID: 0033311696     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051048     Document Type: Article

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