Mechanical characterizations of nitride films deposited by ion-beam based techniques

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 39-44

  Djouadi, M A ^a   Bouchier, D ^b   Stambouli, V ^b   Ilias, S ^b  

^a ENSAM   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

In depth stress profiles; Intrinsic stress; Ion beam bombardment; Nitride films

Indexed keywords

ANNEALING; BORON COMPOUNDS; ION BEAMS; ION BOMBARDMENT; RESIDUAL STRESSES; SHOT PEENING; SILICON NITRIDE; SPUTTER DEPOSITION; THERMAL STRESS;

BORON NITRIDE; ION BEAM ASSISTED DEPOSITION (IBAD); REACTIVE ION BEAM SPUTTERING DEPOSITION (RIBSD);

THIN FILMS;

EID: 0031359492     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00161-8     Document Type: Article

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