In situ stress analysis of boron nitride films prepared by ion beam assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 139, Issue 1-4, 1998, Pages 327-331

  Zeitler, M ^a   Sienz, S ^a   Neumann, H ^b   Zeuner, M ^b   Gerlach, J W ^a   Rauschenbach, B ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Cubic boron nitride; Ion assisted deposition; Stress measurement

Indexed keywords

ARGON; DEPOSITION; FILM PREPARATION; ION BEAMS; ION IMPLANTATION; MECHANICAL VARIABLES MEASUREMENT; MONOLAYERS; NITROGEN; PLASTIC DEFORMATION; SILICON WAFERS; STRESS ANALYSIS; THERMAL EFFECTS;

COMPRESSIVE STRESSES; ION BEAM ASSISTED DEPOSITION (IBAD); TENSILE STRESSES;

CUBIC BORON NITRIDE;

EID: 0032043612     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00045-7     Document Type: Article

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