Current induced effects in aluminum thin films

Thin Solid Films

Volumn 353, Issue 1, 1999, Pages 1-7

  Oliva, A I ^a   Quintana, P ^a   Ceh, O ^a   Corona, J E ^a   Aguilar, M ^b  

^a DEPARTAMENTO DE FÍSICA APLICADA   (Mexico)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; DEGRADATION; ELECTROMIGRATION; METALLIC FILMS; PLASTIC DEFORMATION; SILICON; STRESSES; THERMAL EFFECTS; THERMAL EXPANSION; THERMAL VARIABLES MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

CURRENT INDUCED EFFECTS; FREE EVAPORATION; GRAZING INCIDENCE X RAY DIFFRACTION; JOULE EFFECT;

THIN FILMS;

EID: 0033308317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00370-3     Document Type: Article

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