The future of silicide for CMOS contacts

Materials Research Society Symposium - Proceedings

Volumn 564, Issue , 1999, Pages 35-45

  Roy, R A ^a   Cabral Jr , C ^a   Lavoie, C ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; ELECTRIC CONTACTS; ELECTRIC RESISTANCE; TITANIUM COMPOUNDS;

COBALT SILICIDE; TITANIUM SILICIDE;

CMOS INTEGRATED CIRCUITS;

EID: 0033279704     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-564-35     Document Type: Article

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