FEOL technology trend

Materials Chemistry and Physics

Volumn 52, Issue 3, 1998, Pages 191-199

  Taur, Yuan ^a   Ning, Tak H ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Bipolar circuits; Front end of line technology; Semiconductors

Indexed keywords

BIPOLAR SEMICONDUCTOR DEVICES; ENERGY GAP; SEMICONDUCTOR DEVICE MANUFACTURE;

FRONT END OF LINE TECHNOLOGY;

CMOS INTEGRATED CIRCUITS;

EID: 0032026170     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(97)02029-4     Document Type: Review

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