Laser-assisted TiSi2 formation for ULSI applications

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 265-272

  Shamma, Nader ^a   Talwar, Somit ^a   Verma, Gaurav ^a   Kramer, Karl Josef ^a   Farrar, Nigel ^a   Chi, Chi,u ^a   Greene, Wayne ^a   Weiner, Kurt ^a  

^a HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC RESISTANCE MEASUREMENT; EXCIMER LASERS; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

TITANIUM SILICIDE;

METALLIC FILMS;

EID: 0031333530     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-265     Document Type: Conference Paper

References (9)