Photoacid Diffusion in Chemically Amplified DUV Resists

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 110-125

  Itani, Toshiro ^a   Yoshino, Hiroshi ^a   Hashimoto, Shuichi ^a   Yamana, Mitsuharu ^a   Samoto, Norihiko ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347877231     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch009     Document Type: Article

References (18)

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